FLAG Works, Inc. sponsors the North American Chemical Residue Workshop (NACRW) formerly the Florida Pesticide Residue Workshop (FPRW) which conducts an annual meeting for scientists particularly interested in trace level analysis of pesticides, veterinary drug residues, and other chemicals in food, animal feed, and environmental samples. The purpose of the meeting is to provide training, develop and improve technical knowledge, facilitate development and distribution of new analysis methods and techniques, and establish networking to promote professional cooperation between scientists of these interests. While the majority of attendees are from North America, important international speakers are always included in the Technical Program, and attendance of scientists from Asia, Europe, South America, Australia, and Africa is increasing annually.
The meeting is expected to have between 300 to 350 attendees representing government, academia, and industries. The program is designed for technical scientists and lab managers alike; interactive forums and daily poster and vendor sessions will be held.
Poster sessions will be held each morning in the Exhibits area.
Vendor sessions are planned for Sunday Evening and during breakfasts and lunches each day during the event.
There will be exhibitors representing analytical instrument companies, laboratory and analytical standards suppliers, and analytical service laboratories.
Visit the archives for information about previous meetings.
Who should attend?
Bench chemists, laboratory managers, quality managers, and anyone else involved in pesticide residue or environmental contaminant residue analyses.
Why should they attend?
- To gain valuable information on the methodologies and analytical tools used in residue level analyses of pesticides, veterinary drugs and environmental contaminants.
- To meet others who are doing the very same things, and to establish valuable contacts with many experts.
- To learn about regulatory issues effecting chemical residue work.
- To visit vendor exhibits and see the latest in instrumentation.